{"id":8800,"date":"2024-07-02T14:02:26","date_gmt":"2024-07-02T06:02:26","guid":{"rendered":"https:\/\/www.lneya.com\/?p=8800"},"modified":"2024-07-02T14:02:40","modified_gmt":"2024-07-02T06:02:40","slug":"temperature-control-and-chillers-in-oxidation-diffusion-process","status":"publish","type":"post","link":"https:\/\/tw.lneya.com\/de\/uncategorized\/temperature-control-and-chillers-in-oxidation-diffusion-process.html","title":{"rendered":"Temperaturregelung und K\u00e4ltemaschinen im Oxidationsdiffusionsverfahren"},"content":{"rendered":"<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<h2 class=\"wp-block-heading\" style=\"font-size:20px\">Temperaturregelung und K\u00e4ltemaschinen im Oxidationsdiffusionsverfahren<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<div class=\"wp-block-themepark-block-themepark-wright content-super-p\" style=\"font-size:16px;line-height:28px;text-indent:2em;color:#666666;background-color:#fffaf0;padding:10px 10px;\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\">\n<p class=\"has-black-color has-text-color has-link-color wp-elements-aa1a64468cd3a88f8f773f57376e973b wp-block-paragraph\" style=\"font-size:18px\">The oxidation diffusion process is a key step in semiconductor manufacturing. It is mainly used to form precise oxide layers and doping, and has extremely strict requirements for temperature control. In this process, the chiller, as an important part of temperature control, needs to meet the following requirements:<\/p>\n<\/div>\n<\/div>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-black-color has-text-color has-link-color wp-elements-4794632d4edcb3e2d5c44a5a9e9cae8e wp-block-paragraph\"><strong>High-precision Temperature Control:<\/strong> During the oxidation diffusion process, slight fluctuations in temperature will significantly affect the oxidation rate, oxide layer thickness and doping uniformity. The chiller needs to be able to provide a temperature control accuracy of \u00b10.1\u2103 to \u00b11\u2103 to ensure the stability and repeatability of the process.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-black-color has-text-color has-link-color wp-elements-522c450d7d9d5ea576b9195fd2df5f8c wp-block-paragraph\">Fast Response: The process may require rapid heating and cooling. The chiller needs to have the ability to respond quickly, reach the set temperature in a short time, and quickly adjust according to the process requirements to meet the requirements of the temperature curve.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-black-color has-text-color has-link-color wp-elements-f38cc5e238ce93bd9381bf89f5c36f0f wp-block-paragraph\"><strong>Wide Temperature Range:<\/strong> The oxidation diffusion temperature is usually between 800\u00b0C and 1200\u00b0C. Although the chiller does not directly cool such a high temperature, it needs to be able to effectively cool the peripheral structure of the process equipment, such as the furnace shell, cooling water circulation system, etc., to maintain the safe operating temperature of the equipment.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-black-color has-text-color has-link-color wp-elements-68c0927ccac400d853704c712cd39801 wp-block-paragraph\"><strong>Continuous and Stable Operation:<\/strong> Semiconductor manufacturing is a continuous batch production. The chiller needs to be able to operate 24 hours a day, provide continuous and stable cooling capacity, and ensure the continuity and reliability of the entire production process.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-black-color has-text-color has-link-color wp-elements-ff82dd00db3cc4b6811c3e1699db12df wp-block-paragraph\"><strong>Corrosion-resistant Materials: <\/strong>Since corrosive gases (such as silane, phosphine, arsine, etc.) may be used in the process, the contact parts of the chiller need to use corrosion-resistant materials to extend the life of the equipment and avoid pollution.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-black-color has-text-color has-link-color wp-elements-04b24cd439e9279fe19c799f82e96fca wp-block-paragraph\"><strong>High Energy Efficiency and Low Noise: <\/strong>Considering environmental protection and the comfort of the operating environment, the chiller should be designed with high energy efficiency and low noise, reduce energy consumption, and improve the quality of the production environment.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-black-color has-text-color has-link-color wp-elements-1e0f20e5da39687110ca45d55a66e021 wp-block-paragraph\"><strong>Intelligent Control and Monitoring: <\/strong>Integrate advanced control systems such as PLC or more advanced automation systems to achieve remote monitoring, fault alarm and data recording, which is convenient for process management and optimization.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"has-vivid-red-color has-text-color has-link-color wp-elements-b3b2e079dd0e036b2d1926bff10d934d wp-block-paragraph\">In summary, the chiller in the oxidation diffusion process must not only have high-precision and fast-response temperature control capabilities, but also meet multiple requirements such as corrosion resistance, continuous and stable operation, and intelligent management to adapt to the high requirements and strict standards of semiconductor manufacturing.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<section class=\"wp-block-themepark-block-themepark-area block_layout thempark-block undefined\" id=\"\" style=\"padding-top:29px;\" data-swiper-parallax=\"-700\"><div class=\"block_layout_in\" style=\"\"><div class=\"post_in_list_head modle_title2\"><h3><span style=\"font-size:31px;\" class=\"main-title\">Cooling Chillers<\/span><span style=\"color:#333333;font-size:31px;\" class=\"as-title\"> for Semiconductor<\/span><\/h3><div class=\"title_boout\"><div class=\"title_bo\" style=\"border-bottom:4px solid #f29900;\"><\/div><\/div><\/div>\n<div class=\"wp-block-column block_layout_in is-layout-flow wp-block-column-is-layout-flow\"><div id=\"post_in_list2\" class=\"post_in_list_out\" style=\"margin-bottom:20px;\"><ul class=\"post_in_list row4  nobig\" data-cat=\"\"data-tag=\"\"data-nb=\"4\"data-rand=\"\"data-page=\"2\" data-modle=\"post_in_list2\"data-pbtn=\"More\"data-pbtnicon=\"fas fa-clipboard-list\"data-seo2=\"\"data-wtitlesize=\"16\"data-wtitlecolor=\"\"data-wtitlehight=\"55\"data-btncolor=\"#146ba2\"data-first=\"\"data-b2=\"\"data-b1=\"0\"data-row=\"4\"data-canshu=\"0\"data-wtitlecolor2=\"\"data-home=\"https:\/\/tw.lneya.com\/de\"><\/ul><div class=\"tishi\"><p class=\"loading\"><i class=\"fas fa-spinner\"><\/i>Laden...<\/p><p class=\"lasetpost\">\u5df2\u7ecf\u662f\u5230\u6700\u540e\u4e00\u7bc7\u5185\u5bb9\u4e86\uff01<\/p><\/div><\/div><\/div>\n<\/div><div class=\"layout_badh\"><\/div><\/section>","protected":false},"excerpt":{"rendered":"<p>Temperature control and chillers in oxidation diffusion process High-precision Temperature Control: During the oxidation diffusion process, slight fluctuations in temperature will significantly affect the oxidation rate, oxide layer thickness and doping uniformity. The chiller needs to be able to provide a temperature control accuracy of \u00b10.1\u2103 to \u00b11\u2103 to ensure the stability and repeatability of [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_kad_blocks_custom_css":"","_kad_blocks_head_custom_js":"","_kad_blocks_body_custom_js":"","_kad_blocks_footer_custom_js":"","themepark_post_bcolor":"#f5f5f5","themepark_post_width":"1022px","themepark_post_img":"","themepark_post_img_po":"left","themepark_post_img_re":false,"themepark_post_img_cover":false,"themepark_post_img_fixed":false,"themepark_post_hide_title":true,"themepark_post_main_b":"","themepark_post_main_p":100,"themepark_paddingblock":false,"footnotes":""},"categories":[1],"tags":[156],"class_list":["post-8800","post","type-post","status-publish","format-standard","hentry","category-uncategorized","tag-semiconductor-chiller"],"metadata":{"_edit_lock":["1719900162:1"],"themepark_post_img":[""],"themepark_post_img_re":[""],"themepark_post_img_cover":[""],"themepark_post_img_fixed":[""],"themepark_post_hide_title":["1"],"themepark_paddingblock":[""],"footnotes":[""],"_edit_last":["1"],"catce":["sidebar-widgets4"],"views":["1680"],"_headinfo":["a:1:{i:0;a:23:{s:6:\"module\";s:1:\"4\";s:7:\"navtext\";i:16;s:4:\"navb\";b:1;s:5:\"navpd\";i:23;s:5:\"navc1\";s:7:\"#014391\";s:5:\"navc2\";s:7:\"#0095d4\";s:5:\"navc4\";s:7:\"#fbfbfb\";s:5:\"navc5\";s:7:\"#ffffff\";s:5:\"navc6\";i:0;s:5:\"topc1\";s:7:\"#ffffff\";s:5:\"topc2\";s:7:\"#2ba8db\";s:4:\"topf\";i:12;s:6:\"seach1\";s:0:\"\";s:6:\"seach2\";s:0:\"\";s:3:\"sub\";i:209;s:8:\"searchbl\";i:5;s:6:\"navlib\";b:0;s:8:\"subhight\";i:550;s:8:\"submoshi\";s:0:\"\";s:9:\"navheight\";i:76;s:6:\"shadow\";i:0;s:5:\"sicon\";s:7:\"#014391\";s:7:\"search1\";s:7:\"#014391\";}}"],"_top_left_txt1":["a:1:{i:0;a:3:{s:4:\"text\";s:81:\" 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