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Il principio di funzionamento dei refrigeratori utilizzati nei processi di deposizione chimica del vapore (CVD) e di deposizione fisica del vapore (PVD) dei semiconduttori consiste principalmente nel rimuovere il calore generato durante il processo facendo circolare acqua di raffreddamento o...
Visualizza dettagliIon implantation is an important step in semiconductor manufacturing processes to precisely dope and control the electrical properties of semiconductor materials by implanting high-energy ions into them. This process generates a lot of heat, so ch...
Visualizza dettagliTemperature Control Accuracy: The semiconductor manufacturing process has extremely strict requirements for temperature control. The heating circulator can provide precise temperature control, ensuring that the temperature remains within a very sm...
Visualizza dettagliNel processo di collaudo degli imballaggi dei semiconduttori, in particolare nel processo di controllo della temperatura della macchina selezionatrice (stazione della sonda di collaudo), l'uso dei refrigeratori si basa principalmente sui seguenti motivi: Stabilità della temperatura e precisione...
Visualizza dettagliChemical Vapor Deposition (CVD): In the CVD process, a multi-channel chiller is used to cool the reaction chamber walls, heat exchangers, and gas preheating exchangers to maintain stable reaction chamber temperature, ensuring precise control of fi...
Visualizza dettagliThe chip lead bonding process indeed requires precise temperature control, so temperature control systems are usually equipped to ensure process stability and yield. The following are the importance and application scenarios of temperature control...
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INQUIRY FLTZ -100℃～+90℃ Low Temperature Cascade Refrigeration Series Model FLTZ-002 FLTZ-003 FLTZ-004 FLTZ-006 FLTZ-008 FLTZ-010 FLTZ-015 FLTZ-002W FLTZ-003W FLTZ-004W FLTZ-006W FLTZ-008W FLTZ-010W FLTZ-015W Temperature range 5℃～90℃ Temperature ...
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Model FLTZ-305W FLTZ-305W/2T Double System Temp Range -30℃~40℃ -30℃~40℃ -30℃~40℃ Temp control accuracy ±0.1℃ ±0.1℃ ±0.1℃ Flow Control 15～45L/min ±0.3 15～45L/min ±0.3 15～45L/min ±0.3 Pump Pressure 6bar max 6bar max 6bar max Heati...
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Heating method within 40 ℃ adopts a compressor hot gas heating fully enclosed design, and the machine operates continuously for 24 hours Mainly used for precise temperature control in semiconductor production and testing processes, heating within ...
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Temp Range: +5℃~90℃ ±0.3℃ Cooling Capacity: 5kw~30kw Tank volume: 6L~15L Power: 06KW~1.6KW Heating method within 40 ℃ adopts a compressor hot gas heating fully enclosed design, and the machine operates continuously for 24 hours The sem...
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工業冷水機製造商 LNEYA Taiwan
