Buscar en toda la estación
En la industria de los semiconductores, un horno de difusión es un dispositivo utilizado para fabricar capas de dopaje en la superficie de materiales semiconductores. Consigue el proceso de dopaje mediante calentamiento a alta temperatura y atmósfera de difusión controlada....
Ver detallesPrecautions for using the wafer testing temperature control system
Ver detallesUsage environment for wafer thin film deposition cooling chiller
Ver detallesThe power management chip temperature test system is an important equipment used to test the performance and reliability of semiconductor chips in different temperature environments. When purchasing this type of test equipment, you need to conside...
Ver detalles
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Ver detalles
INQUIRY Product data download manual.pdf Parameters Detailed Model LTS-402 LTS-403 LTS-404 LTS-406 LTS-408 LTS-402W LTS-403W LTS-404W LTS-406W LTS-408W Temperature range -40℃～35℃ Temperature control accuracy ±0.1℃ -40℃～-10℃ Flow control 7～2...
Ver detalles
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Ver detalles
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Ver detalles
工業冷水機製造商 LNEYA Taiwan
