LTS -20℃~80

2023-05-17 2501

It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...

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LTS -40℃~80

2023-05-17 2646

INQUIRY Product data download manual.pdf Parameters Detailed Model LTS-402 LTS-403 LTS-404 LTS-406 LTS-408 LTS-402W LTS-403W LTS-404W LTS-406W LTS-408W Temperature range -40℃～35℃ Temperature control accuracy ±0.1℃ -40℃～-10℃ Flow control 7～2...

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LTS -60℃~80

2023-05-17 2477

It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...

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LTS -80℃~80

2023-05-17 2434

It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...

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