Pesquisar toda a estação
In the semiconductor industry, a diffusion furnace is a device used to manufacture doping layers on the surface of semiconductor materials. It achieves the doping process through high-temperature heating and controlled diffusion atmosphere. The di...
Ver detalhesPrecauções para utilizar o sistema de controlo da temperatura de ensaio de bolachas
Ver detalhesAmbiente de utilização para o refrigerador de arrefecimento de deposição de película fina de bolacha
Ver detalhesThe power management chip temperature test system is an important equipment used to test the performance and reliability of semiconductor chips in different temperature environments. When purchasing this type of test equipment, you need to conside...
Ver detalhes
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Ver detalhes
INQUIRY Product data download manual.pdf Parameters Detailed Model LTS-402 LTS-403 LTS-404 LTS-406 LTS-408 LTS-402W LTS-403W LTS-404W LTS-406W LTS-408W Temperature range -40℃～35℃ Temperature control accuracy ±0.1℃ -40℃～-10℃ Flow control 7～2...
Ver detalhes
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Ver detalhes
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Ver detalhes
工業冷水機製造商 LNEYA Taiwan
