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In der Halbleiterindustrie ist ein Diffusionsofen ein Gerät, das zur Herstellung von Dotierschichten auf der Oberfläche von Halbleitermaterialien verwendet wird. Der Dotierungsprozess wird durch Hochtemperaturerwärmung und kontrollierte Diffusionsatmosphäre erreicht...
Details anzeigenPrecautions for using the wafer testing temperature control system
Details anzeigenEinsatzumgebung für Wafer-Dünnschichtabscheidung Kühlgerät
Details anzeigenThe power management chip temperature test system is an important equipment used to test the performance and reliability of semiconductor chips in different temperature environments. When purchasing this type of test equipment, you need to conside...
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It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
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INQUIRY Product data download manual.pdf Parameters Detailed Model LTS-402 LTS-403 LTS-404 LTS-406 LTS-408 LTS-402W LTS-403W LTS-404W LTS-406W LTS-408W Temperature range -40℃～35℃ Temperature control accuracy ±0.1℃ -40℃～-10℃ Flow control 7～2...
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It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Details anzeigen
It is widely used in the semiconductor manufacturing process to control the temperature of the reaction chamber, the temperature of the heat sink, and the temperature control of the non-flammable fluid of the heat transfer medium. 1. The pressure ...
Details anzeigen
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